CC BY
22LP-O-8
Nonlinear femtosecond optical lithography for the micro- and nano-structuring
N. Minaev1, M. Tarchov2
1Federal Scientific Research Centre "Crystallography and Photonics" of Russian Academy of Sciences, Institute of Photon Technologies, Moscow- Troitsk, Russian Federation 2Institute of Nanotechnologies of Microelectronics of the Russian Academy of Sciences, Department of development and research of micro- and nanosystems, Moscow, Russian Federation
It presents results of research of the possibilities a new approach to optical laser photolithography, carried out at the unique femtosecond laser complex of the Institute of Photonic Technologies of the Federal Research Center "Crystallography and Photonics" of the Russian Academy. We used method of nonlinear femtosecond optical lithography (NFOL) [1] with help of them, due to the high localization of the process of nonlinear absorption of femtosecond laser radiation, we managed to form in standard commercially available polymer resistive materials a structure with a resolution not limited by the diffraction limit (up to 100 nm). The parameters of the process irradiating samples of various resistive materials in the mode of nonlinear femtosecond optical lithography, allowing to achieve high resolution during the formation of structures in thin resistive layers, are determined. A series of test matrix structures with different topologies was created and analyzed, using as example the maximum possible resolution in the proposed resistive materials using the developed method. The achieved repeatable resolution on several resistive materials ranges from 100 to 200 nm, on individual samples it was possible to obtain a resolution in individual elements less than 100 nm (up to 50 nm). Selected modes were used in the formation of prototypes of full-functional sensitive elements of superconducting nanowire single-photon detectors, as well as large planar structures of a centimeter scale. When combining the proposed method with additive two-photon femtosecond microstereolithography technology, it is possible to create prototypes of complex optoelectronic devices on laboratory scale, in fact, using a single femtosecond laser microstructuring setup.
This work was supported by the Ministry of Science and Higher Education within the State assignment FSRC «Crystallography and Photonics» RAS, Russian Science Foundation (Project No. 18-07-01052), Ministry of Education and Science of the Russian Federation (Project No. 0004-2019-0004).
References
[1] Minaev N. V, Tarkhov M.A., Dudova D.S., Timashev P.S., Chichkov B.N., Bagratashvili V.N. Fabrication of superconducting nanowire single-photon detectors by nonlinear femtosecond optical lithography // Laser Phys. Lett. IOP Publishing, - 2018. - Vol. 15 - № 2. - P. 1-6. 10.1088/1612-202X/aa8bd1.
